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Optimum pH for Double-Pass RO Operation Recommended interpass pH: 8.4–8.7 Introduction: Ultrapure water (UPW) systems used in power generation and semiconductor manufacturing require very low levels of silica and boron. These specifications are typically achieved using double-pass reverse osmosis (RO) followed by electrodeionization (EDI). In EDI, dissolved carbon dioxide competes with silica removal because carbonic … Read more
The Electropure EDI technical model, and how to improve silica and boron removal
At the 2 nm semiconductor technology node, dissolved oxygen (DO) transitions from a corrosion variable to a functional device contaminant.
Boron must be a ppt levels in ultrapure water for semiconductor at advanced 2 nm node technology.
A US antiscalant company has developed a new silica-control chemistry designed specifically to disrupt the silica polymerization on membranes
Boron and silica differ in their acid–base chemistry, which is why boron removal and silica removal require different EDI and ion-exchange approaches.
Paths to Improve Boron Rejection using 2-Pass RO
Silica polymerizes. Boron does not. And Boron is harder to remove using RO, IX, and EDI than Silica.
Ultrapure Water and Hydrogen Production for Fuel Cells Hydrogen (H₂) is a key fuel for hydrogen fuel cells, but it does not exist freely in nature. To make hydrogen available as an energy carrier, it must be produced through industrial processes—many of which depend on pure or ultrapure water. Method 1: Water Electrolysis Electrolysis splits … Read more
Mechanism of Silica Removal in Electrodeionization (3-Zone EDI Model) Michael J Snow, Ph.D. May 2006 Keywords: Electrodeionization, EDl, CEDI, Water, Pure, Ultrapure, Silica, SiO2, Silicic acid, H4SiO4, Reactive; Non-reactive; Colloidal; Reverse Osmosis; lon-Exchange; Resin; Anion; Cation; Fouling; Rejection; Process design; Membrane; Zones; Electropure; SnowPure ABSTRACT: Electrodeionization (EDI) is a continuous separation process that uses a … Read more