Mechanism of Silica Removal in Electrodeionization (Updated 2026)
The Electropure EDI technical model, and how to improve silica and boron removal
The Electropure EDI technical model, and how to improve silica and boron removal
Boron must be a ppt levels in ultrapure water for semiconductor at advanced 2 nm node technology.
Boron and silica differ in their acid–base chemistry, which is why boron removal and silica removal require different EDI and ion-exchange approaches.
Paths to Improve Boron Rejection using 2-Pass RO
Silica polymerizes. Boron does not. And Boron is harder to remove using RO, IX, and EDI than Silica.