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How to Optimize Boron Removal System for Semiconductor

Paths to Improve Boron Rejection using 2-Pass RO

Typical Boron RO Rejection Expectations

Boron Levels in Typical RO Feedwaters

Boron Levels Required for Semiconductor Manufacturing

Paths to Improve Boron Rejection using 2-Pass RO

  1. Raise feed pH to the 2nd-pass RO into the ~9.5–9.8 range so boric acid converts to borate ion (B(OH)₄⁻) which RO rejects much better. CO2 is also minimized.

  2. Use a tighter/high-rejection membrane for the 2nd pass (low MWCO / high-boron rejection type).

  3. Operate at higher RO flux in the 2nd pass (improves rejection). 2nd pass can run at 30+ GFD.

  4. Operate the EDI at higher than normal voltage to encourage water splitting. Minimize FCE fed to the EDI. CO2 is minimized because of interstage pH.
  5. Add a polishing resin (boron-selective media) downstream. This also affords boron security against RO-EDI upsets.

Why pH matters (most effective single change)

Membrane & system operating changes

Summary

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