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Optimum pH for Double-Pass RO Operation Recommended interpass pH: 8.4–8.7 Introduction: Ultrapure water (UPW) systems used in power generation and semiconductor manufacturing require very low levels of silica and boron. These specifications are typically achieved using double-pass reverse osmosis (RO) followed by electrodeionization (EDI). In EDI, dissolved carbon dioxide competes with silica removal because carbonic … Read more
The Electropure EDI technical model, and how to improve silica and boron removal
At the 2 nm semiconductor technology node, dissolved oxygen (DO) transitions from a corrosion variable to a functional device contaminant.
Boron must be a ppt levels in ultrapure water for semiconductor at advanced 2 nm node technology.
A US antiscalant company has developed a new silica-control chemistry designed specifically to disrupt the silica polymerization on membranes
Boron and silica differ in their acid–base chemistry, which is why boron removal and silica removal require different EDI and ion-exchange approaches.
Paths to Improve Boron Rejection using 2-Pass RO
Silica polymerizes. Boron does not. And Boron is harder to remove using RO, IX, and EDI than Silica.
Use membrane degassing from Solventum for pushwater for beer production
Bubbles in liquids cause problems, and even if removed more bubbles can form. To prevent bubble formation, remove dissolved gases. This is best done with a Liqui-Cel contactor from Thermo Fisher Solventum, supported by SnowPure.